An adsorbent prepared from Acid Activated Hibiscus Sabdariffa Stem, by acid treatment was tested for its efficiency in removing metal ion. The process parameters studied include agitation time, initial Nickel ion concentration, adsorbent dose, pH and temperature. The adsorption followed second order reaction equation and the rate is mainly controlled by intra-particle diffusion. Freundlich and Langmuir isotherm models were applied to the equilibrium data. The adsorption capacity (QM) obtained from the Langmuir isotherm plot at an initial pH of 6.0 and at 30, 40, 50, 60 ± 0.50C. The influence of pH on metal ion removal was significant and the adsorption was increased with increase in temperature. A portion of the nickel ion was recovered from the spent AHSNC using 0.1M HCl.

Sitaphal frequently known as Annona Squamosa belongs to family Annonaceae. The plant is highly used traditionally in curing diverse disorders. Sitaphal is a multipurpose tree with edible fruits. Commonly it is used as cough and cold and sneezing nose, antibacterial, and anti-infective. The leaves of Annona squamosa contain valuable quantity of ascorbic acid and tannins. Sitaphal regularly can help to beautify skin naturally. The vitamin. A content present abundantly in this fruit benefits to keep skin healthy. Sitaphal is very large and good commercial importance so considered as native fruit of country. This review particularly deals with the phytochemicals, medicinal importance of Annona squamosa.

The concept of Key Control Characteristics (KCC) and Key Product Characteristics (KPC) are presented in this article. Based on this, assembly sensitivity is defined, and it is described in feature, stage and system level. On the basis of state space model of assembly process, this paper considers the problem of assembly sensitivity analysis in a multi-station assembly process. Based on the concept of Key Control Characteristics (KCC) and Key Product Characteristics (KPC), we focus on the unique challenges brought by the multi-station system, namely, a system level model to characterize the variation propagation in the entire process, and the necessity to describe the system response to variation inputs at both global (system level) and local (station level and single fixture level) scales. State space representation is employed to recursivelydescribe the propagation of variation in such a multi-station process, incorporating process design informationsuch as fixture locating layout at individual stations and station-to-station locating layout change. Following the sensitivity analysis in control theory, an aeorplane assembly example is analyzed.